fatto leva Nucleare acetone photoresist removal miscela Sada Oceano
Removal of high-dose P+ ion-implanted photoresist on GaAs in the mixture of dimethyl sulfoxide and acetonitrile - ScienceDirect
Double‐layer resist method to improve descum result when removing negative photoresist - Yang - 2019 - Micro & Nano Letters - Wiley Online Library
Replacing NMP: Are You Ready? I 3D InCites
In search of a better photoresist
Atomic Layer Deposition on Phase-Shift Lithography Generated Photoresist Patterns for 1D Nanochannel Fabrication
Photolithography 光刻 Part II: Photoresists
Photoresist Removal
Characterization of Aligned Wafer-Level Transfer of Thin and Flexible Parylene Membranes
Photoresist Removal
Photoresist as a choice of molecularly thin gate dielectrics in graphene-based devices: APL Materials: Vol 9, No 3
Photolithography (PL)
Semiconductor Photoresist Strip processing
11. How can resist coatings be removed again? - Allresist EN
A) Fabrication process: 15 μm parylene deposited on glass substrate.... | Download Scientific Diagram
Clean-Room Lithographical Processes for the Fabrication of Graphene Biosensors
Dry etching and residue removal of functional polymer mixed with TiO 2 microparticles via inductively coupled CF 4 /O 2 plasma and ultrasonic-treated ... - RSC Advances (RSC Publishing) DOI:10.1039/C6RA07688B
Step 1: the photoresist is spin-coated onto a thoroughly cleaned wafer... | Download Scientific Diagram
Multilayer Graphene with Chemical Modification as Transparent Conducting Electrodes in Organic Light-Emitting Diode | Nanoscale Research Letters | Full Text
High-angle etching process of LNO cells: a seed layer deposition and... | Download Scientific Diagram
Cell Patterning on Photolithographically Defined Parylene-C: SiO2 Substrates | Protocol